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| George Whitfield | |||||||||||||||||||
| Graduate Student | ![]() |
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S.B. Materials Science and Engineering |
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| Masters of Engineering, DMSE | |||||||||||||||||||
| Massachusetts Institute of Technology | |||||||||||||||||||
| 77 Massachusetts Ave. |
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| 617-253-2364 | |||||||||||||||||||
| Room 13-4010 | |||||||||||||||||||
| gcw (at) mit (dot) edu | |||||||||||||||||||
| Cambridge, MA 02139 USA | |||||||||||||||||||
George is working on the modeling and characterization of chemical sensors that are based on thin-film and nanostructured semiconducting metal oxide materials. These sensors are used to detect trace amounts of harmful and toxic materials, such as NOx and CO, by means of chemisorption at the semiconductor surface. He is investigating novel ways to enhance sensor surface chemistry, through control of materials properties, device design, and environmental factors such as temperature and illumination. He is driven by an ultimate goal to engineer devices with improved sensitivity, selectivity, power consumption, and lifetime, by employing a fundamental understanding of semiconductor device physics. George is a recipient of the Intel Foundation PhD Fellowship Award. Other recent extracurricular activities include serving as an instructor and competitor with the MIT Sport TaeKwonDo Club and as a participant in the MIT-Japan Program. George holds an M.Eng. in Materials Science from MIT, and S.B. from MIT in electrical engineering and computer science, with a minor in materials science. |
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